加速STT-MRAM爬坡特性

Govind Radhakrishnan, Y. Yoon, M. Sachdev
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引用次数: 0

摘要

从最初的堆叠开发到最终的批量生产,磁性隧道结的系统表征至关重要。这直接影响到晶圆的周转时间和上市时间。在这种情况下,磁性隧道结(MTJ)堆叠结构的器件表征是产品开发周期中的关键步骤。本文回顾了过去十年来在自旋转矩传递(STT)-磁阻随机存取存储器(MRAM)表征和测试方面所面临的挑战和取得的进展,这些挑战和进展加速了制造工艺的发展。我们还概述了可测试性设计(DFT)方案,该方案可用于参数灵敏度分析,以及内置自检(BIST)方案,该方案利用DFT进行stt - mram中的位单元健康监测。所提出的方案为测试和表征开辟了新的途径。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Accelerating STT-MRAM Ramp-up Characterization
Systematic characterization is crucial for magnetic tunnel junction from initial stack development to the final mass production. It has a direct impact on the wafer turn-around time and time to market. Under these circumstances, device characterization of the magnetic tunnel junction (MTJ) stack configuration is a critical step in the product development cycle. This paper reviews the challenges and advancements in spin torque transfer (STT)-magnetoresistive random access memory (MRAM) characterization and testing over the past decade that has accelerated the fabrication process ramp-up. We also provide an overview of a design-for-testability (DFT) scheme that can be used for parametric sensitivity analysis and a built-in-self-test (BIST) scheme that utilizes the DFT for bit-cell health monitoring in STT-MRAMs. The proposed schemes open new avenues for testing and characterization.
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