漫射Ge-p-i-n光电二极管的光谱光敏性

A. Fedorenko
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引用次数: 3

摘要

激光测距仪广泛用于各种民用和军事目的,以及在火箭和空间技术中测量距离。这种测距仪的光通道使用基于Si、Ge或InGaAs的高速p-i-n或雪崩光电二极管,这取决于所讨论的测距仪的工作波长。本文介绍了用扩散法制备激光测距仪用高速Ge-p-i-n光电二极管的工艺。钝化层由ZnSe制成,这是这类光电二极管的新解决方案。利用已有的理论模型研究了二极管在不同有源区域参数下的光谱安瓦灵敏度,并通过各自的测量对仿真结果的可靠性进行了评价。结果表明,所得的理论相关性与实测数据吻合较好。此外,作者还首次研究了在λ = 1.4 ~ 1.6 μm范围内涂覆硅滤光片的Ge-p-i-n光电二极管的光谱光敏性。确定了二极管的光谱灵敏度范围为λ = 1.1 ~ 1.7 μm。当波长为λ = 1.54 μm时,光敏度可达0.42 A/W。作者认为,采用硅滤光片的Ge-p-i-n光电二极管能够抵抗λ = 1.064 μm的“致盲”激光辐射。对带滤光片的光电二极管光谱光敏度的计算结果与实验结果吻合较好。因此,所选择的仿真技术可以在理论仿真中考虑到光电二极管的大多数设计和技术特征,从而可以准确地预测和优化其特定实际任务的参数,并改进光电二极管的制造工艺。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Spectral photosensitivity of diffused Ge-p–i–n photodiods
Laser rangefinders are widely used to measure distances for various civil and military purposes, as well as in rocket and space technology. The optical channel of such rangefinders uses high-speed p–i–n, or avalanche, photodiodes based on Si, Ge or InGaAs depending on the operating wavelength of the rangefinder in question. The paper describes a manufacturing process for high-speed Ge-p–i–n photodiodes for laser rangefinders using the diffusion method. The passivation layer is made of ZnSe, which is a new solution for this type of photodiodes. The existing theoretical models are used to study the spectral ampere-watt sensitivity of the diodes at various values of the active region parameters, and the simulation results reliability is evaluated by the respective measurements. It is shown that the obtained theoretical dependence well agrees with the measurement data. Moreover, the authors for the first time study the spectral photosensitivity of the Ge-p–i–n photodiode with a coated silicon filter covering the range λ = 1.4—1.6 μm. The spectral sensitivity range for the diodes is determined to be λ = 1.1—1.7 μm. The maximum photosensitivity of 0.42 A/W is achieved at a wavelength of λ = 1.54 μm. The authors argue that Ge-p–i–n photodiodes with a silicon filter are resistant to the “blinding” laser radiation with λ = 1.064 μm. The calculated data on the spectral photosensitivity of the photodiode with a filter also well agree with the experiment. Thus, the chosen simulation technique allows taking into account most design and technological characteristics of the photodiodes during theoretical simulation, which makes it possible to accurately predict and optimize their parameters for a specific practical task and improve the manufacturing process of the photodiodes.
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