辐射硬半导体晶圆厂的碳奈米管记忆体与结构

D. K. Brock, J. Ward, B. Segal, T. Rueckes, M. Lovellette, M. Polavarapu, T. Mclntyre, S. Danziger
{"title":"辐射硬半导体晶圆厂的碳奈米管记忆体与结构","authors":"D. K. Brock, J. Ward, B. Segal, T. Rueckes, M. Lovellette, M. Polavarapu, T. Mclntyre, S. Danziger","doi":"10.1109/AERO.2005.1559547","DOIUrl":null,"url":null,"abstract":"This paper details the results of a project to transition Nantero's laboratory carbon nanotube (CNT) process technology into the BAE Systems radiation-hard CMOS production foundry to enable the development of novel nanotechnology-based solutions for government space applications. Working jointly, BAE Systems and Nantero have successfully developed the necessary processes, recipes, and protocols to enable BAE Systems to develop rad-hard CMOS-CNT hybrid devices and circuits. The success of this project has established the BAE Systems Manassas, VA facility as the first U.S. government sponsored foundry to qualify carbon nanotubes for use within a production fab line. The project addressed all aspects needed to qualify nanotubes and comprised three main steps: 1) development of recipes for coating a 150 mm wafer with a monolayer fabric of single-walled nanotubes (SWNTs), 2) edge-bead removal (EBR) of the CNTs from around the edge, bevel, and backside of the wafer to prevent contamination of further processing equipment, 3) demonstration of repeatable coating and EBR of the CNTs between various wafers over multiple lots. The fabrication process for creating a 1-2 nm thick monolayer fabric of SWNTs is described and characterized with respect to the fabric thickness, resistivity, elemental composition, particle count and uniformity","PeriodicalId":117223,"journal":{"name":"2005 IEEE Aerospace Conference","volume":"58 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Carbon Nanotube Memories and Fabrics in a Radiation Hard Semiconductor Foundry\",\"authors\":\"D. K. Brock, J. Ward, B. Segal, T. Rueckes, M. Lovellette, M. Polavarapu, T. Mclntyre, S. Danziger\",\"doi\":\"10.1109/AERO.2005.1559547\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper details the results of a project to transition Nantero's laboratory carbon nanotube (CNT) process technology into the BAE Systems radiation-hard CMOS production foundry to enable the development of novel nanotechnology-based solutions for government space applications. Working jointly, BAE Systems and Nantero have successfully developed the necessary processes, recipes, and protocols to enable BAE Systems to develop rad-hard CMOS-CNT hybrid devices and circuits. The success of this project has established the BAE Systems Manassas, VA facility as the first U.S. government sponsored foundry to qualify carbon nanotubes for use within a production fab line. The project addressed all aspects needed to qualify nanotubes and comprised three main steps: 1) development of recipes for coating a 150 mm wafer with a monolayer fabric of single-walled nanotubes (SWNTs), 2) edge-bead removal (EBR) of the CNTs from around the edge, bevel, and backside of the wafer to prevent contamination of further processing equipment, 3) demonstration of repeatable coating and EBR of the CNTs between various wafers over multiple lots. The fabrication process for creating a 1-2 nm thick monolayer fabric of SWNTs is described and characterized with respect to the fabric thickness, resistivity, elemental composition, particle count and uniformity\",\"PeriodicalId\":117223,\"journal\":{\"name\":\"2005 IEEE Aerospace Conference\",\"volume\":\"58 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-03-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2005 IEEE Aerospace Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/AERO.2005.1559547\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 IEEE Aerospace Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/AERO.2005.1559547","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

摘要

本文详细介绍了一个项目的结果,该项目将Nantero的实验室碳纳米管(CNT)工艺技术转化为BAE系统公司抗辐射CMOS生产铸造厂,从而为政府空间应用开发基于新型纳米技术的解决方案。BAE系统公司和Nantero公司共同合作,成功开发了必要的工艺、配方和协议,使BAE系统公司能够开发抗雷达CMOS-CNT混合器件和电路。该项目的成功建立了BAE系统公司位于弗吉尼亚州马纳萨斯的工厂,使其成为美国政府资助的第一家合格的碳纳米管制造厂。该项目解决了纳米管合格所需的所有方面,包括三个主要步骤:1)开发在150毫米晶圆上涂覆单壁纳米管(SWNTs)单层结构的配方;2)从晶圆边缘、斜角和背面去除碳纳米管的边珠(EBR),以防止进一步加工设备的污染;3)在多个批次的不同晶圆之间演示可重复涂层和碳纳米管的EBR。描述了制造1- 2nm厚单壁碳纳米管单层织物的制造工艺,并对织物厚度、电阻率、元素组成、颗粒计数和均匀性进行了表征
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Carbon Nanotube Memories and Fabrics in a Radiation Hard Semiconductor Foundry
This paper details the results of a project to transition Nantero's laboratory carbon nanotube (CNT) process technology into the BAE Systems radiation-hard CMOS production foundry to enable the development of novel nanotechnology-based solutions for government space applications. Working jointly, BAE Systems and Nantero have successfully developed the necessary processes, recipes, and protocols to enable BAE Systems to develop rad-hard CMOS-CNT hybrid devices and circuits. The success of this project has established the BAE Systems Manassas, VA facility as the first U.S. government sponsored foundry to qualify carbon nanotubes for use within a production fab line. The project addressed all aspects needed to qualify nanotubes and comprised three main steps: 1) development of recipes for coating a 150 mm wafer with a monolayer fabric of single-walled nanotubes (SWNTs), 2) edge-bead removal (EBR) of the CNTs from around the edge, bevel, and backside of the wafer to prevent contamination of further processing equipment, 3) demonstration of repeatable coating and EBR of the CNTs between various wafers over multiple lots. The fabrication process for creating a 1-2 nm thick monolayer fabric of SWNTs is described and characterized with respect to the fabric thickness, resistivity, elemental composition, particle count and uniformity
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信