Al2O3、HfO2和SiO2多层原子层沉积紫外宽带增透膜

Optical Interference Coatings Conference (OIC) 2019 Pub Date : 2019-06-02 DOI:10.1364/OIC.2019.FB.5

Qing-Yuan Cai, Gao Lingshan, Luo Haihan, Cong Rui, Dingquan Liu

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引用次数: 0

摘要

以HfO2为H层，采用ALD法制备了250~390 nm光谱范围内的紫外宽带增透膜M2HL。用HfO2- al2o3纳米层压板代替AR涂层中的HfO2，获得了更高的透光率。

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UV Broadband Antireflection Coating Using Al2O3, HfO2 and SiO2 Multilayer by Atomic Layer Deposition

UV broadband antireflection film M2HL in 250~390 nm spectral range was prepared by ALD using HfO2 as H layer. Higher transmittance was acquired when HfO2-Al2O3 nano-laminate replaced of HfO2 in the AR coating.

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Optical Interference Coatings Conference (OIC) 2019

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