{"title":"氧中电子雪崩的粒子法数值模拟","authors":"C. Soria, F. Pontiga, A. Castellanos","doi":"10.1109/CEIDP.1997.641151","DOIUrl":null,"url":null,"abstract":"The development of an electron avalanche is simulated by means of a particle method. The avalanche is initiated from a number of seed electrons that are introduced in the vicinity of the cathode. The effects of ionization, attachment, recombination and secondary-electron emission from the cathode are all included. Electron and ion densities have been computed for the first 15 ns.","PeriodicalId":176239,"journal":{"name":"IEEE 1997 Annual Report Conference on Electrical Insulation and Dielectric Phenomena","volume":"21 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-10-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Numerical modeling of an electron avalanche in oxygen by a particle method\",\"authors\":\"C. Soria, F. Pontiga, A. Castellanos\",\"doi\":\"10.1109/CEIDP.1997.641151\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The development of an electron avalanche is simulated by means of a particle method. The avalanche is initiated from a number of seed electrons that are introduced in the vicinity of the cathode. The effects of ionization, attachment, recombination and secondary-electron emission from the cathode are all included. Electron and ion densities have been computed for the first 15 ns.\",\"PeriodicalId\":176239,\"journal\":{\"name\":\"IEEE 1997 Annual Report Conference on Electrical Insulation and Dielectric Phenomena\",\"volume\":\"21 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-10-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE 1997 Annual Report Conference on Electrical Insulation and Dielectric Phenomena\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CEIDP.1997.641151\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE 1997 Annual Report Conference on Electrical Insulation and Dielectric Phenomena","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CEIDP.1997.641151","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Numerical modeling of an electron avalanche in oxygen by a particle method
The development of an electron avalanche is simulated by means of a particle method. The avalanche is initiated from a number of seed electrons that are introduced in the vicinity of the cathode. The effects of ionization, attachment, recombination and secondary-electron emission from the cathode are all included. Electron and ion densities have been computed for the first 15 ns.