{"title":"不同浓度BF2+掺杂对多晶硅栅PMOS的影响","authors":"Abduazimkhodjaev Aziz, N. S. Zamani","doi":"10.1109/SCORED.2009.5443098","DOIUrl":null,"url":null,"abstract":"This paper presents the effect of various doping concentration of BF<inf>2</inf><sup>+</sup>polysilicon from 10<sup>11</sup> to 10<sup>20</sup> (atoms/cm<sup>3</sup>) for PMOS device using SILVACO TCAD (Technology Computer Aided Design) software. The threshold voltage of polysilicon obtain from I<inf>D</inf>-V<inf>GS</inf> curve was analyzed. The results show that BF<inf>2</inf><sup>+</sup> at dose 10<sup>14</sup> to 10<sup>19</sup> (atoms/cm<sup>3</sup>) giving the better characteristics of the PMOS at the threshold voltage between 1.0V to 1.3V. The resistivity of the polysilicon is gradually decreased as a concentration of doping increase, while the conductivity is reciprocal of the resistivity. The resistivity of polysilicon varies considerably depending upon the requirement in PMOS applications. To determine the better doping, the leakage current can be extracted from the I-V curve.","PeriodicalId":443287,"journal":{"name":"2009 IEEE Student Conference on Research and Development (SCOReD)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2009-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Effect of the various doping concentration of BF2+ on polysilicon-gate PMOS\",\"authors\":\"Abduazimkhodjaev Aziz, N. S. Zamani\",\"doi\":\"10.1109/SCORED.2009.5443098\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents the effect of various doping concentration of BF<inf>2</inf><sup>+</sup>polysilicon from 10<sup>11</sup> to 10<sup>20</sup> (atoms/cm<sup>3</sup>) for PMOS device using SILVACO TCAD (Technology Computer Aided Design) software. The threshold voltage of polysilicon obtain from I<inf>D</inf>-V<inf>GS</inf> curve was analyzed. The results show that BF<inf>2</inf><sup>+</sup> at dose 10<sup>14</sup> to 10<sup>19</sup> (atoms/cm<sup>3</sup>) giving the better characteristics of the PMOS at the threshold voltage between 1.0V to 1.3V. The resistivity of the polysilicon is gradually decreased as a concentration of doping increase, while the conductivity is reciprocal of the resistivity. The resistivity of polysilicon varies considerably depending upon the requirement in PMOS applications. To determine the better doping, the leakage current can be extracted from the I-V curve.\",\"PeriodicalId\":443287,\"journal\":{\"name\":\"2009 IEEE Student Conference on Research and Development (SCOReD)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 IEEE Student Conference on Research and Development (SCOReD)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SCORED.2009.5443098\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 IEEE Student Conference on Research and Development (SCOReD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SCORED.2009.5443098","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Effect of the various doping concentration of BF2+ on polysilicon-gate PMOS
This paper presents the effect of various doping concentration of BF2+polysilicon from 1011 to 1020 (atoms/cm3) for PMOS device using SILVACO TCAD (Technology Computer Aided Design) software. The threshold voltage of polysilicon obtain from ID-VGS curve was analyzed. The results show that BF2+ at dose 1014 to 1019 (atoms/cm3) giving the better characteristics of the PMOS at the threshold voltage between 1.0V to 1.3V. The resistivity of the polysilicon is gradually decreased as a concentration of doping increase, while the conductivity is reciprocal of the resistivity. The resistivity of polysilicon varies considerably depending upon the requirement in PMOS applications. To determine the better doping, the leakage current can be extracted from the I-V curve.
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