离子注入诱导辐射缺陷是一种很有前途的掺杂半导体型AIVBIV薄膜的方法

Z. Dashevsky
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引用次数: 0

摘要

研究了不同杂质离子注入在PbTe单晶和外延膜中引起的辐射缺陷,缺陷大小可达2/spl middot/10/sup 4/ /spl mu/C/cm/sup 2/。由于电子浓度稳定在2+4/spl / middot/10/sup / 18/ cm/sup -3/这一水平上,深达3/ spl μ m以上的点缺陷(大部分为Te空位)的形成决定了输运性质。基于PbTe导带中Te空位的准局域(双重态)能级模型对数据进行了解释。在注入Zn的PbTe薄层中发现了固溶体的形成,并伴有带隙的增大。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Radiation defects induced by ion implantation as a promising method of doping semiconductor type AIVBIV films
Radiation defects in PbTe single crystals and epitaxial films induced by ion implantation of various impurities amounting to as much as 2/spl middot/10/sup 4/ /spl mu/C/cm/sup 2/ have been investigated. It has been found that the formation of point defects (for the most part, Te vacancies) running as deep as 3 /spl mu/m and more determine transport properties due to the stabilization of electron concentration at a level of 2+4/spl middot/10/sup 18/ cm/sup -3/. The data are interpreted based on the model of the quasi-local (doublet) energy level of Te vacancies in the PbTe conduction band. The formation of solid solutions accompanied by the increase of band gap was detected in PbTe thin layers implanted with Zn.
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