基于Ge/Si核/壳纳米线的肖特基二极管光电特性研究

Dongwoo Suh, Lin Chen, W. Lu
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引用次数: 0

摘要

对生长在Si(111)上的Ge/Si芯/壳纳米线制备的肖特基光电二极管的电学性能和微观结构进行了定量分析。采用VLS法生长的单纳米线构成的器件,在3 μm的中红外波段可以探测到小于1 pA的光。目前纳米线肖特基光电二极管的势垒为1.5伏。利用热离子模型研究了纳米肖特基结在正向偏置和反向偏置下的电特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photoelectric characteristics of Schottky diode based on a Ge/Si core/shell nanowire
Schottky photodiode fabricated with Ge/Si core/shell nanowires grown on Si (111) was quantitatively analyzed in terms of electrical properties as well as microstructure. The present device comprised of single nanowire grown by VLS process is quite sensitive enough to detect less than 1 pA at the mid infrared of 3 μm. The barrier of the present nanowire Schottky photodiode isj 1.5 volts. We scrutinized the electrical characteristics of the nanoscale Schottky junction both at forward and reverse bias ranges with thermionic model.
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