三维集成TSV/RDL的电测量与分析

Xin Sun, R. Fang, Yunhui Zhu, Xiao Zhong, Yuan Bian, Shengli Ma, M. Miao, J. Chen, Yan Wang, Yufeng Jin
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引用次数: 4

摘要

本文对TSV/RDL进行了电学测量和分析,以评价TSV/RDL互连结构的制作工艺,全面了解TSV/RDL互连结构的电学性能。实现了直流电阻、漏电流和高频特性。TSV直流电阻呈扩张性分布,最小值为4.3 mΩ。TSV漏电流可达150nA至30V而不击穿。低衬底电阻率降低了TSV的高频性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electrical measurement and analysis of TSV/RDL for 3D integration
In this paper, electrical measurement and analysis of TSV/RDL is carried out, to evaluate the fabrication process and get a comprehensive understanding of electrical properties of TSV/RDL interconnect structures. DC resistance, leakage current and high frequency characterization are implemented. TSV shows a spreading distribution of DC resistance, with minimum of 4.3 mΩ. Leakage current of TSV reaches 150nA up to 30V without breakdown. Low substrate resistivity lowers the high frequency performance of TSV.
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