在铜衬底上生长的碳纳米管的高效场发射

2007 IEEE International Vacuum Electronics Conference Pub Date : 2007-05-15 DOI:10.1109/IVELEC.2007.4283350

Xiaowei Yin, Qilong Wang, C. Lou, Xiaobing Zhang, W. Lei, Chengxian Huang, Guodong Yang

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引用次数: 1

摘要

采用热化学气相沉积(CVD)技术在抛光铜衬底上生长了碳纳米管。镍薄膜作为催化剂沉积在金属衬底上，反应物气体为乙炔。从I-V曲线和F-N曲线可以观察到CNTs发射体的有效场发射(发射面积约为3.14 mm2)。在2.87V/um的电场下，获得了密度大于20mA的稳定发射电流。利用扫描电镜和透射电镜对碳纳米管的形貌进行了表征。

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Efficient field emission of carbon nanotubes grown on a copper substrate

Carbon nanotubes have been grown on a polished copper substrate by thermal chemical vapor deposition (CVD). Nickel film is deposited on the metallic substrate as catalyst and the reactant gas is acetylene. Efficient field emission of CNTs emitters (Emission area is about 3.14 mm2) is observed from I-V and F-N curves. Stable emission current with the density of more than 20mA was got at the electric field of 2.87V/um. SEM and TEM were used to characterize the morphologies of carbon nanotubes.

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2007 IEEE International Vacuum Electronics Conference

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