亚波长分辨率激光光刻在MEMS领域的应用

G. Moagăr-Poladian
{"title":"亚波长分辨率激光光刻在MEMS领域的应用","authors":"G. Moagăr-Poladian","doi":"10.1117/12.801971","DOIUrl":null,"url":null,"abstract":"In this paper I present some techniques by which MEMS structures with sub-wavelength resolution can be obtained when using laser lithography. I concentrate on two major techniques: single photon and multi-photon absorption processes.","PeriodicalId":390439,"journal":{"name":"Industrial Laser Applications: INDLAS","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2008-03-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Sub-wavelength resolution laser lithography in the field of MEMS\",\"authors\":\"G. Moagăr-Poladian\",\"doi\":\"10.1117/12.801971\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper I present some techniques by which MEMS structures with sub-wavelength resolution can be obtained when using laser lithography. I concentrate on two major techniques: single photon and multi-photon absorption processes.\",\"PeriodicalId\":390439,\"journal\":{\"name\":\"Industrial Laser Applications: INDLAS\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-03-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Industrial Laser Applications: INDLAS\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.801971\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Industrial Laser Applications: INDLAS","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.801971","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

本文介绍了利用激光光刻技术获得亚波长分辨率的MEMS结构的一些技术。我集中在两个主要的技术:单光子和多光子吸收过程。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Sub-wavelength resolution laser lithography in the field of MEMS
In this paper I present some techniques by which MEMS structures with sub-wavelength resolution can be obtained when using laser lithography. I concentrate on two major techniques: single photon and multi-photon absorption processes.
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