{"title":"用于显示和未来集成电路的高迁移率SnO2 TFT","authors":"A. Chin, C. Shih, Chun-Fu Lu, W. Su","doi":"10.1109/AM-FPD.2016.7543695","DOIUrl":null,"url":null,"abstract":"Very high mobility of 149~189 cm<sup>2</sup>/Vs, large on-to-off current ratio (I<sub>ON</sub>/I<sub>Off</sub>) of >7 orders of magnitude, fast turn-on sub-threshold swing of 110 mV/decade, and low power operation at 2~2.5 V were achieved in SnO<sub>2</sub> TFT device at an ultra-thin SnO<sub>2</sub> thickness of 4.5 nm. The device mobility of SnO<sub>2</sub> TFT is higher than the best ZnO-based TFTs and CVD-grown multi-layers MoS<sub>2</sub> MOSFETs. The reached mobility is already 0.7 times of universal mobility of SiO<sub>2</sub>/Si nMOSFET, operated typically at >1 MV/cm field. The very high mobility, simple low temperature process, and ultra-thin body SnO<sub>2</sub> transistor should find its crucial role for high resolution display, future sub-10 nm nMOSFET and brain-mimicking 3D IC.","PeriodicalId":422453,"journal":{"name":"2016 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","volume":"212 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"High mobility SnO2 TFT for display and future IC\",\"authors\":\"A. Chin, C. Shih, Chun-Fu Lu, W. Su\",\"doi\":\"10.1109/AM-FPD.2016.7543695\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Very high mobility of 149~189 cm<sup>2</sup>/Vs, large on-to-off current ratio (I<sub>ON</sub>/I<sub>Off</sub>) of >7 orders of magnitude, fast turn-on sub-threshold swing of 110 mV/decade, and low power operation at 2~2.5 V were achieved in SnO<sub>2</sub> TFT device at an ultra-thin SnO<sub>2</sub> thickness of 4.5 nm. The device mobility of SnO<sub>2</sub> TFT is higher than the best ZnO-based TFTs and CVD-grown multi-layers MoS<sub>2</sub> MOSFETs. The reached mobility is already 0.7 times of universal mobility of SiO<sub>2</sub>/Si nMOSFET, operated typically at >1 MV/cm field. The very high mobility, simple low temperature process, and ultra-thin body SnO<sub>2</sub> transistor should find its crucial role for high resolution display, future sub-10 nm nMOSFET and brain-mimicking 3D IC.\",\"PeriodicalId\":422453,\"journal\":{\"name\":\"2016 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)\",\"volume\":\"212 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-07-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/AM-FPD.2016.7543695\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/AM-FPD.2016.7543695","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Very high mobility of 149~189 cm2/Vs, large on-to-off current ratio (ION/IOff) of >7 orders of magnitude, fast turn-on sub-threshold swing of 110 mV/decade, and low power operation at 2~2.5 V were achieved in SnO2 TFT device at an ultra-thin SnO2 thickness of 4.5 nm. The device mobility of SnO2 TFT is higher than the best ZnO-based TFTs and CVD-grown multi-layers MoS2 MOSFETs. The reached mobility is already 0.7 times of universal mobility of SiO2/Si nMOSFET, operated typically at >1 MV/cm field. The very high mobility, simple low temperature process, and ultra-thin body SnO2 transistor should find its crucial role for high resolution display, future sub-10 nm nMOSFET and brain-mimicking 3D IC.