Effect of technological parameters of the process of pulsed magnetron sputtering on the structure and phase composition on TiN-based coatings

Subject of research: coatings based on TiN deposited by pulsed magnetron sputtering have been studied. Purpose of research: is to establish the effect of technological parameters of the process of pulsed magnetron sputtering: the discharge current and the N2 content in the vacuum chamber on the structure and phase composition of coatings based on TiN. Methods and objects of research: the phase composition and structural characteristics of the TiN-based coating were studied in the course of X-ray diffraction and X-ray phase analysis of coatings. The microstructure of the formed coatings based on TiN was studied using scanning electron microscopy. The object of the study were samples of VK6 hard alloy with TiN coatings. Main results of research: it has been established that the magnitude of the discharge current has the greatest influence on the formed structure of the TiN coating. An increase in the content of N2 and the discharge current leads to a change in the phase composition and the formation of a single-phase coating based on the (111) c-TiN cubic phase with an increase in the degree of texture of the coating. The optimal values ​​of technological parameters are determined at which a coating based on the c-TiN phase is formed, with a minimum level of internal stresses, the smallest grain size, and a dense, columnar structure.