a-Si/Ni双分子层的结晶特性、记录机理及其在一次性写入蓝光光盘中的应用前景

2006 Optical Data Storage Topical Meeting Pub Date : 2006-06-22 DOI:10.1117/12.685186

Yung-Chium Her, Sen-Tsun Jean

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引用次数: 3

摘要

本文研究了a-Si/Ni双层记录膜在热退火和脉冲激光照射下的结晶特性和记录机理。测定了a-Si/Ni双层记录膜退火前后的光学性能。此外，还进行了动态测试，以评估a-Si/Ni双分子层在一次性写入蓝光光盘中的应用潜力

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Crystallization Characteristics and Recording Mechanism of a-Si/Ni Bilayer and Its Potential for use in Write-Once Blue Ray Disk

In this work, the crystallization characteristics and recording mechanism of a-Si/Ni bilayer recording film under thermal annealing and pulsed laser irradiation are investigated. The optical properties of the a-Si/Ni bilayer recording film before and after annealing were measured. In addition, the dynamic test was conducted to evaluate the potential of the a-Si/Ni bilayer for use in the write-once blue-ray disk

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2006 Optical Data Storage Topical Meeting

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