含自热效应的功率GaN HEMT热稳定性研究

A. Aouf, F. Djeffal, F. Douak
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引用次数: 5

摘要

本文在分析自热现象对功率GaN HEMT性能影响的基础上,提出了详尽的分析研究。为此,建立了漏极电流、功耗和晶格温度变化的分析模型,以评估器件在自热效应(SHEs)下的可靠性。系统地研究了晶体管的热稳定性与缓冲层掺杂、摩尔分数变化和缓冲层厚度的关系。本文研究了功率GaN HEMT结构的电学和热学性能。此外,还观察和分析了器件设计参数对热稳定性和抗扰度的影响。所得结果为弥合高功率性能与热稳定系数之间的差距提供了新的见解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Thermal stability investigation of power GaN HEMT including self-heating effects
In this paper, exhaustive analytical investigation based on analyzing the impact of the self-heating phenomenon on the power GaN HEMT performance is proposed. To do so, analytical models for the drain current, power dissipation and lattice temperature variation are developed in order to evaluate the device reliability against the self-heating effects (SHEs). The transistor thermal stability is systematically investigated with respect to the dependence on the buffer layer doping, mole fraction variation, and layer thickness. In this work, the electrical and thermal performance of power GaN HEMT structure is investigated. Also, device design parameters dependent characteristics on thermal stability and immunity are observed and analyzed. The obtained results provide new insight for bridging the gap between high power performances with thermal stability factor.
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