高级mosfet偏置相关接入电阻的提取

Boumediene Zatout, D. Maafri, Salim Kerai
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引用次数: 0

摘要

针对射频应用的超薄体和BOX完全耗尽绝缘体上硅(UTBB FD-SOI)晶体管的充分建模需要从s参数测量中准确提取所有等效电路元件的值。本文提出了一种新颖的直接提取方法来确定MOSFET的所有外在和内在元素值。该方法建立在两个主要观测基础上:第一,在直流偏置条件下的独立栅极电阻值;第二,在任何工作偏置条件下,从s参数测量中提取的漏极/源极电阻的偏置变化。新的提取方法采用线性回归技术对由晶体管z矩阵实部定义的参数曲线进行提取。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Extraction of bias dependent access resistances of advanced MOSFETs
Adequate modeling of Ultra-Thin Body and BOX Fully Depleted Silicon-on-Insulator (UTBB FD-SOI) transistor for RF applications requires accurate extracted values of all equivalent circuit elements from S-parameters measurements. This paper proposes an original direct extraction method for determining all MOSFET extrinsic and intrinsic elements values. The method is built up on two main observations: first, the independent gate resistance value with DC bias condition, and second, the bias variations of the drain/source resistances extracted from S-parameters measurements at any operating bias conditions. The new extraction method uses linear regression techniques on parametric curves defined by the real parts of the transistor Z-matrix.
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