{"title":"高级mosfet偏置相关接入电阻的提取","authors":"Boumediene Zatout, D. Maafri, Salim Kerai","doi":"10.1109/ICAEE53772.2022.9962089","DOIUrl":null,"url":null,"abstract":"Adequate modeling of Ultra-Thin Body and BOX Fully Depleted Silicon-on-Insulator (UTBB FD-SOI) transistor for RF applications requires accurate extracted values of all equivalent circuit elements from S-parameters measurements. This paper proposes an original direct extraction method for determining all MOSFET extrinsic and intrinsic elements values. The method is built up on two main observations: first, the independent gate resistance value with DC bias condition, and second, the bias variations of the drain/source resistances extracted from S-parameters measurements at any operating bias conditions. The new extraction method uses linear regression techniques on parametric curves defined by the real parts of the transistor Z-matrix.","PeriodicalId":206584,"journal":{"name":"2022 2nd International Conference on Advanced Electrical Engineering (ICAEE)","volume":"3 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-10-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Extraction of bias dependent access resistances of advanced MOSFETs\",\"authors\":\"Boumediene Zatout, D. Maafri, Salim Kerai\",\"doi\":\"10.1109/ICAEE53772.2022.9962089\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Adequate modeling of Ultra-Thin Body and BOX Fully Depleted Silicon-on-Insulator (UTBB FD-SOI) transistor for RF applications requires accurate extracted values of all equivalent circuit elements from S-parameters measurements. This paper proposes an original direct extraction method for determining all MOSFET extrinsic and intrinsic elements values. The method is built up on two main observations: first, the independent gate resistance value with DC bias condition, and second, the bias variations of the drain/source resistances extracted from S-parameters measurements at any operating bias conditions. The new extraction method uses linear regression techniques on parametric curves defined by the real parts of the transistor Z-matrix.\",\"PeriodicalId\":206584,\"journal\":{\"name\":\"2022 2nd International Conference on Advanced Electrical Engineering (ICAEE)\",\"volume\":\"3 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-10-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2022 2nd International Conference on Advanced Electrical Engineering (ICAEE)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICAEE53772.2022.9962089\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 2nd International Conference on Advanced Electrical Engineering (ICAEE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICAEE53772.2022.9962089","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Extraction of bias dependent access resistances of advanced MOSFETs
Adequate modeling of Ultra-Thin Body and BOX Fully Depleted Silicon-on-Insulator (UTBB FD-SOI) transistor for RF applications requires accurate extracted values of all equivalent circuit elements from S-parameters measurements. This paper proposes an original direct extraction method for determining all MOSFET extrinsic and intrinsic elements values. The method is built up on two main observations: first, the independent gate resistance value with DC bias condition, and second, the bias variations of the drain/source resistances extracted from S-parameters measurements at any operating bias conditions. The new extraction method uses linear regression techniques on parametric curves defined by the real parts of the transistor Z-matrix.