干涉光刻技术在光子晶体集成波导器件中的平行制造

2005 OSA Topical Meeting on Information Photonics (IP) Pub Date : 2005-06-06 DOI:10.1364/AOPT.2005.JWB10

A. Chincholi, S. Banerjee, J.S. Huang, D. Klotzkin

{"title":"干涉光刻技术在光子晶体集成波导器件中的平行制造","authors":"A. Chincholi, S. Banerjee, J.S. Huang, D. Klotzkin","doi":"10.1364/AOPT.2005.JWB10","DOIUrl":null,"url":null,"abstract":"Multiple exposure interference lithography is a promising way to fabricate areas of photonic crystals areas lithographically mapped for easy integration with conventional waveguides or optical devices. Preliminary results on fabrication of square PCs are reported.","PeriodicalId":212240,"journal":{"name":"2005 OSA Topical Meeting on Information Photonics (IP)","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Parallel fabrication of photonic crystals (PC) using interference lithography for integrated waveguide-PC devices\",\"authors\":\"A. Chincholi, S. Banerjee, J.S. Huang, D. Klotzkin\",\"doi\":\"10.1364/AOPT.2005.JWB10\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Multiple exposure interference lithography is a promising way to fabricate areas of photonic crystals areas lithographically mapped for easy integration with conventional waveguides or optical devices. Preliminary results on fabrication of square PCs are reported.\",\"PeriodicalId\":212240,\"journal\":{\"name\":\"2005 OSA Topical Meeting on Information Photonics (IP)\",\"volume\":\"26 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-06-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2005 OSA Topical Meeting on Information Photonics (IP)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/AOPT.2005.JWB10\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 OSA Topical Meeting on Information Photonics (IP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/AOPT.2005.JWB10","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 1

摘要

多次曝光干涉光刻是一种很有前途的制造光子晶体区域的方法，光刻映射的光子晶体区域易于与传统波导或光学器件集成。报道了方形pc的初步制备结果。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Parallel fabrication of photonic crystals (PC) using interference lithography for integrated waveguide-PC devices

Multiple exposure interference lithography is a promising way to fabricate areas of photonic crystals areas lithographically mapped for easy integration with conventional waveguides or optical devices. Preliminary results on fabrication of square PCs are reported.

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2005 OSA Topical Meeting on Information Photonics (IP)

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