{"title":"反应磁控溅射:一种离线参数辨识方法","authors":"A. Kelemen, Róbert Rossi Madarász","doi":"10.1109/SACI51354.2021.9465630","DOIUrl":null,"url":null,"abstract":"The goal of this paper is the offline parameter identification of the Berg model, intended to be used for magnetron sputtering and thin film deposition process control. A graphical parameter estimation method is developed using simplified equations that contain only the most significant terms in both metallic and poisoned modes of operation. The approximations are based on numerical examples. Special experiment conditions are also formulated that better facilitate the identification of some model parameters.","PeriodicalId":321907,"journal":{"name":"2021 IEEE 15th International Symposium on Applied Computational Intelligence and Informatics (SACI)","volume":"19 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-05-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Reactive magnetron sputtering: an offline parameter identification method\",\"authors\":\"A. Kelemen, Róbert Rossi Madarász\",\"doi\":\"10.1109/SACI51354.2021.9465630\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The goal of this paper is the offline parameter identification of the Berg model, intended to be used for magnetron sputtering and thin film deposition process control. A graphical parameter estimation method is developed using simplified equations that contain only the most significant terms in both metallic and poisoned modes of operation. The approximations are based on numerical examples. Special experiment conditions are also formulated that better facilitate the identification of some model parameters.\",\"PeriodicalId\":321907,\"journal\":{\"name\":\"2021 IEEE 15th International Symposium on Applied Computational Intelligence and Informatics (SACI)\",\"volume\":\"19 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-05-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2021 IEEE 15th International Symposium on Applied Computational Intelligence and Informatics (SACI)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SACI51354.2021.9465630\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IEEE 15th International Symposium on Applied Computational Intelligence and Informatics (SACI)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SACI51354.2021.9465630","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Reactive magnetron sputtering: an offline parameter identification method
The goal of this paper is the offline parameter identification of the Berg model, intended to be used for magnetron sputtering and thin film deposition process control. A graphical parameter estimation method is developed using simplified equations that contain only the most significant terms in both metallic and poisoned modes of operation. The approximations are based on numerical examples. Special experiment conditions are also formulated that better facilitate the identification of some model parameters.