PHEMT和MESFET晶体管的一种新的经验门电容模型

J. R. Loo-Yau, R. Infante-Galindo, J. Reynoso‐Hernández
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引用次数: 2

摘要

本文研究了GaAs MESFET、HEMT和PHEMT晶体管栅极-源电容CGS (VGS, VDS)和栅极-漏极电容CGD (VGS, VDS)的非线性模型。建立了CGS (VGS, VDS)和CGD (VGS, VDS)电容的解析偏置依赖表达式。CGS (VGS, VDS)和CGD (VGS, VDS)的实验值采用小信号等效电路的多偏置提取方法得到。模型和实验数据之间很好的一致性,作为门源和漏源偏置的函数,得到。所提出的非线性模型的主要特点是不需要优化就能使模型与实验数据很好地拟合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A New Empirical Gate Capacitance Model for PHEMT and MESFET Transistors
This work deals with a nonlinear model for the gate-source capacitance CGS (VGS, VDS) and gate-drain capacitance CGD (VGS, VDS) of GaAs MESFET, HEMT and PHEMT transistors. An analytical bias dependent expression for modeling the CGS (VGS, VDS) and CGD (VGS, VDS) capacitances is developed. The CGS (VGS, VDS) and CGD (VGS, VDS) experimental values are obtained using a multibias extraction of the small signal equivalent circuit procedure. Good agreement between modeled and experimental data, as a function of gate-source and drain-source bias, is obtained. The main feature of the proposed nonlinear model is that no optimization is needed to achieve a good fit of modeled to experimental data.
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