采用低应力工艺制备的可靠性提高的自对准C/ x波段单片功率HBT放大器

T. Henderson, T.S. Kim
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引用次数: 12

摘要

我们报告了采用低应力工艺为单片放大器制造的GaAs单指C/ x波段hbt的广泛可靠性测试和分析,该hbt是自对准的,以最大限度地提高射频功率性能,具有边缘钝化和低应力外延基底和介电涂层,以提高可靠性。在T/sub /=185-340/spl度/C和J/sub /=25-50 kA/cm/sup /下进行。描述了各种观察到的失效模式和机制的温度和电流依赖关系。长期(>3000小时)、低温(<250/spl℃)、大电流应力测试被发现是hbt在标称工作条件下如何降解的准确指标。较短的高温试验可能导致对活化能和中位失效时间的过于乐观的预测。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Improved reliability self-aligned C/X-band monolithic power HBT amplifiers fabricated with a low-stress process
We report extensive reliability testing and analysis on GaAs single-finger C/X-band HBTs fabricated for monolithic amplifiers with a low-stress process, The HBTs are self-aligned to maximize RF power performance, with ledge passivation and a low stress epitaxial base and dielectric overcoat to improve reliability. Performed from T/sub jo/=185-340/spl deg/C and J/sub co/=25-50 kA/cm/sup 2/. The temperature and current dependence of the various observed failure modes and mechanisms are described. Long-term (>3000 hour), low temperature (<250/spl deg/C), high current stress tests are found to be accurate indicators of how HBTs degrade under nominal operating conditions. Shorter, high temperature tests may lead to excessively optimistic predictions of activation energy and median time to failure.
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