{"title":"基于重建-等效啁啾技术的毫米波双波长DFB激光器","authors":"Bocheng Yuan, Jianqin Shi, Wenxuan Qi, Yunshan Zhang, Lianyan Li, Ning Xu, Xiangfei Chen","doi":"10.1109/UCET51115.2020.9205324","DOIUrl":null,"url":null,"abstract":"A monolithic integrated dual-wavelength distribute feedback (DFB) laser with equivalent apodized sampling Bragg grating (SBG) is proposed in this paper. The simulation results show that such a grating structure possesses dual-wavelength narrow transmission peaks in +1st channel and the wavelength spacing between the two lasing modes can be designed from 56 GHz to 103 GHz by varying the cavity length. Utilizing the reconstruction-equivalent-chirp (REC) technique, the apodization is achieved by modulating the duty cycle of SBGs. The grating structure of the laser can be fabricated by holographic exposure combined with conventional lithography.","PeriodicalId":163493,"journal":{"name":"2020 International Conference on UK-China Emerging Technologies (UCET)","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A Dual-Wavelength DFB Laser Based on Reconstruction-Equivalent-Chirp Technology for Millimeter-Wave Generation\",\"authors\":\"Bocheng Yuan, Jianqin Shi, Wenxuan Qi, Yunshan Zhang, Lianyan Li, Ning Xu, Xiangfei Chen\",\"doi\":\"10.1109/UCET51115.2020.9205324\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A monolithic integrated dual-wavelength distribute feedback (DFB) laser with equivalent apodized sampling Bragg grating (SBG) is proposed in this paper. The simulation results show that such a grating structure possesses dual-wavelength narrow transmission peaks in +1st channel and the wavelength spacing between the two lasing modes can be designed from 56 GHz to 103 GHz by varying the cavity length. Utilizing the reconstruction-equivalent-chirp (REC) technique, the apodization is achieved by modulating the duty cycle of SBGs. The grating structure of the laser can be fabricated by holographic exposure combined with conventional lithography.\",\"PeriodicalId\":163493,\"journal\":{\"name\":\"2020 International Conference on UK-China Emerging Technologies (UCET)\",\"volume\":\"27 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-08-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 International Conference on UK-China Emerging Technologies (UCET)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/UCET51115.2020.9205324\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 International Conference on UK-China Emerging Technologies (UCET)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/UCET51115.2020.9205324","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A Dual-Wavelength DFB Laser Based on Reconstruction-Equivalent-Chirp Technology for Millimeter-Wave Generation
A monolithic integrated dual-wavelength distribute feedback (DFB) laser with equivalent apodized sampling Bragg grating (SBG) is proposed in this paper. The simulation results show that such a grating structure possesses dual-wavelength narrow transmission peaks in +1st channel and the wavelength spacing between the two lasing modes can be designed from 56 GHz to 103 GHz by varying the cavity length. Utilizing the reconstruction-equivalent-chirp (REC) technique, the apodization is achieved by modulating the duty cycle of SBGs. The grating structure of the laser can be fabricated by holographic exposure combined with conventional lithography.
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