平面光波导中光折变损伤引起的模式退化

F. Jariego, F. Agulló-Lóoez
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引用次数: 0

摘要

电光材料,特别是LiNbO3,被用于制造光波导和各种集成光学器件。然而,这种器件的性能受到光引起的折射率变化的阻碍,折射率变化导致模式退化。这种损伤或光折变效应(PRE)已经在LiNbO3中得到了广泛的研究2,并且许多实验已经处理了波导中的模式退化3,4,5。然而,对这些现象的理论描述还处于非常初级和不令人满意的阶段。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mode Degradation by Photorefractive Damage in Planar Optical Waveguides
Electrooptic materials, particularly LiNbO3, are used to fabricate optical waveguides and a variety of integrated optics devices1. However, the performance of this devices is hampered by the light-induced change in refractive index which leads to mode degradation. This damage or photorefractive effect (PRE) has been extensively investigated2 for LiNbO3 and a number of experiments have dealt with mode degradation in waveguides3,4,5. However, the theoretical description of these phenomena is in a very preliminary and insatisfactory stage.
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