紫外和太阳光照下原子层沉积法制备ZnO薄膜的光催化活性

2022 International Congress on Advanced Materials Sciences and Engineering (AMSE) Pub Date : 2022-07-22 DOI:10.1109/AMSE51862.2022.10036676

Daria Jardas, A. Omerzu, R. Peter, I. K. Piltaver, M. Petravić

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引用次数: 0

摘要

研究了原子层沉积(ALD)和等离子体增强ALD (PEALD)制备的氧化锌(ZnO)薄膜在紫外和模拟太阳光照下的光催化活性。每种方法均选择最佳沉积温度(ALD为200°C, PEALD为60°C)。在UVC光下，ALD ZnO薄膜表现出较高的光催化活性，而在模拟太阳光下ALD薄膜的光催化活性较好。在弗吉尼亚大学，两种类型的薄膜的结果是相似的。我们已经证明，光催化活性取决于光学性质和晶体结构，两者都没有主导的影响。

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Photocatalytic Activity Under UV and Solar Illumination of Thin ZnO Films Grown by Atomic Layer Deposition

The photocatalytic activity of thin zinc oxide (ZnO) films grown by atomic layer deposition (ALD) and plasma-enhanced ALD (PEALD) was investigated under UV and simu-lated solar illumination. Optimal deposition temperatures were chosen for each method (200°C for ALD and 60°C for PEALD). Under UVC light, the PEALD ZnO thin film showed higher photocatalytic activity, while the activity of the ALD film was better under sun-simulating light. At UVA, the results were similar for the two types of thin films. We have shown that the photocatalytic activity depends on both optical properties and crystal structure, with neither of them having a dominant impact.

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2022 International Congress on Advanced Materials Sciences and Engineering (AMSE)

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