一种新的双带隙SiC-on-Si p-发射极,SiGe n-基极,横向肖特基金属集电极(PNM) HBT,具有降低的集电极-发射极偏置电压

M.J. Kumar, C. Reddy
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引用次数: 3

摘要

我们引入了一种新的方法,称为双带隙SiC-on-Si发射极,以降低宽带隙sic -发射极PNP hbt的集电极发射极偏置电压。在我们的方法中,集电极-发射极偏置电压通过部分消除发射极-基极结和集电极-基极结之间的内置电位差而显著降低。我们使用2D器件仿真详细评估了所提议器件的性能。所提出的双带隙SiC-on- si P-emitter SiGe N-base lateral Schottky metal-collector (PNM) HBT显示出接近宽带隙发射极(SiC) PNP HBT的电流增益,而其集电极-发射极偏置电压明显低于SiC PNP HBT。由于其肖特基集电极,所提出的结构的瞬态响应也要优越得多。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A new dual-bandgap SiC-on-Si p-emitter, SiGe n-base, lateral Schottky metal-collector (PNM) HBT on SOI with reduced collector-emitter offset voltage
We introduce a novel approach, called dual bandgap SiC-on-Si emitter, to reduce the collector emitter offset voltage in the case of wide bandgap SiC-emitter PNP HBTs. In our approach, the collector-emitter offset-voltage is reduced significantly by partially eliminating the built-in potential difference between the emitter-base junction and collector-base junction. We have evaluated the performance of the proposed device in detail using 2D device simulation. The proposed dual bandgap SiC-on-Si P-emitter SiGe N-base lateral Schottky metal-collector (PNM) HBT is shown to exhibit a current gain close to that of the wide bandgap emitter (SiC) PNP HBT while its collector-emitter offset-voltage is significantly lower than that of the SiC PNP HBT. The transient response of the proposed structure is also much superior due to its Schottky collector.
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