无源和有源元件介质薄膜中的离子注入

Thin Film Physics and Applications Pub Date : 1998-02-20 DOI:10.1117/12.300659

F. Flory, L. Roux, S. Tisserand, H. Rigneault, S. Robert, G. Mathieu

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引用次数: 0

摘要

研究了钛在氧化硅玻璃和Ta2O5层中的注入效果。结果表明，随着折射率的变化，光学损耗可以降低，并且折射率的变化可以很好地控制。给出了矩形波导和Y结的结果。注入铒的Ta2O5层在绿光和红外光中都表现出发光行为。该涂层的发射图可以用多层结构来控制。

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Ion implantation in dielectric thin films for passive and active components

The consequences of Ti implantation in silica glasses and Ta2O5 layer are studied. It is shown that the optical losses can be low with a variation of the refractive index which can be well controlled. Results on rectangular waveguides and Y junctions are given. Erbium implanted Ta2O5 layers exhibit a luminescent behavior both in the green and in the infra-red. The emission diagram of the coating can be controlled with a multilayer structure.

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Thin Film Physics and Applications

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