缺陷诱导石墨烯结构的带隙研究

S. Karmakar, S. Kundu, G. S. Taki
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引用次数: 1

摘要

石墨烯被认为是最重要的二维材料之一。然而,原始石墨烯的零带隙特性限制了其作为半导体材料的使用。因此,在石墨烯结构中引入缺陷可以产生可用于半导体工业的可观带隙。本文利用量子ESPRESSO的BURAI GUI,采用密度泛函理论(DFT)方法研究了石墨烯及其各种缺陷诱导结构的能带结构和态密度(DOS)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Bandgap Study of Defect Induced Graphene Structures
Graphene is considered as one of the most significant 2-D materials. However, the zero-bandgap property of pristine graphene restricts its use as semi-conductor material. Hence, introducing defect in the graphene structure can produce an appreciable band-gap that can be utilized in semiconducting industry. In this work, band-structure and density of states (DOS) of graphene and its various defect induced structures are studied by employing density functional theory (DFT) method using the BURAI GUI of Quantum ESPRESSO.
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