Chemical Vapor Deposition of Nickel Ferrite Using Ni C5H5 2 and Fe C5H4C4H9 C5H5

Chemical vapor deposition was used to deposit thin films of nickel oxide (NiO) and iron oxide (Fe 2 O 3 ) on silicon substrates. Precursors chosen for this process were nickelocene,Ni(C 5 H 5 ) 2  and n-butylferrocene, Fe(C 5 H 4 C 4 H 9 )(C 5 H 5 ), which were oxidized with oxygen gas in a low-pressure chemical vapor deposition system. Following the deposition of the individual metal oxides, the two precursors were used together with the goal of depositing a thin film of nickel ferrite (NiFe 2 O 4 ). Both co-deposition and cyclic deposition were carried out, and the resulting thin films were analyzed using x-ray photoelectron spectroscopy. This study found that the resulting thin films did not contain NiFe 2 O 4 , but were composed of NiO and Fe 2 O 3  in a different ratio. It is suggested that changing various parameters in this experiment can be used to vary this ratio.