R. Kúdela, M. Kučera, D. Gregušová, V. Cambel, J. Novák
{"title":"1220 nm (In,Ga)(As,P)/InP LED结构的MOVPE生长","authors":"R. Kúdela, M. Kučera, D. Gregušová, V. Cambel, J. Novák","doi":"10.1109/ASDAM.2002.1088502","DOIUrl":null,"url":null,"abstract":"In/sub 1-x/Ga/sub x/As/sub 1-y/P/sub y//InP layers and LED structures were prepared for the wavelength 1220 nm by LP MOVPE. Very high phosphine/arsine ratio (>100) was necessary to achieve desirable quaternary composition at the growth temperature of 650/spl deg/C. Very good surface morphology with the height of the growth steps of one monolayer was measured by AFM on the lattice matched layers. Significant shift of the photoluminescence spectra from p-type layers, contrary to n-type or undoped layers, was measured at 5 K. The electroluminescent spectrum from a quaternary LED measured at 300 K with a maximum at 1224.6 nm is shown.","PeriodicalId":179900,"journal":{"name":"The Fourth International Conference on Advanced Semiconductor Devices and Microsystem","volume":"482 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"MOVPE growth of 1220 nm (In,Ga)(As,P)/InP LED structures\",\"authors\":\"R. Kúdela, M. Kučera, D. Gregušová, V. Cambel, J. Novák\",\"doi\":\"10.1109/ASDAM.2002.1088502\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In/sub 1-x/Ga/sub x/As/sub 1-y/P/sub y//InP layers and LED structures were prepared for the wavelength 1220 nm by LP MOVPE. Very high phosphine/arsine ratio (>100) was necessary to achieve desirable quaternary composition at the growth temperature of 650/spl deg/C. Very good surface morphology with the height of the growth steps of one monolayer was measured by AFM on the lattice matched layers. Significant shift of the photoluminescence spectra from p-type layers, contrary to n-type or undoped layers, was measured at 5 K. The electroluminescent spectrum from a quaternary LED measured at 300 K with a maximum at 1224.6 nm is shown.\",\"PeriodicalId\":179900,\"journal\":{\"name\":\"The Fourth International Conference on Advanced Semiconductor Devices and Microsystem\",\"volume\":\"482 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-12-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"The Fourth International Conference on Advanced Semiconductor Devices and Microsystem\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASDAM.2002.1088502\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Fourth International Conference on Advanced Semiconductor Devices and Microsystem","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASDAM.2002.1088502","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
MOVPE growth of 1220 nm (In,Ga)(As,P)/InP LED structures
In/sub 1-x/Ga/sub x/As/sub 1-y/P/sub y//InP layers and LED structures were prepared for the wavelength 1220 nm by LP MOVPE. Very high phosphine/arsine ratio (>100) was necessary to achieve desirable quaternary composition at the growth temperature of 650/spl deg/C. Very good surface morphology with the height of the growth steps of one monolayer was measured by AFM on the lattice matched layers. Significant shift of the photoluminescence spectra from p-type layers, contrary to n-type or undoped layers, was measured at 5 K. The electroluminescent spectrum from a quaternary LED measured at 300 K with a maximum at 1224.6 nm is shown.