Observation of Influence of Electrical Isolation of Dielectric Substrates on Structure and Reflectivity of Mo/Si Multilayer Coatings

One of the most important general reguirements for soft X-ray optics, and X-ray lithography in particular, is high reflectivity at normal incidence for long wavelength X-rays. Dependence of the multilayer structure on the deposition parameters and identification of appropriate conditions for the growth of multilayers having optimally smooth and sharp interfaces has been reported elsewhere1,2,3,4.