利用传统EDA工具流程将自热效应从晶体管提升到电路级

F. Klemme, Sami Salamin, H. Amrouch
{"title":"利用传统EDA工具流程将自热效应从晶体管提升到电路级","authors":"F. Klemme, Sami Salamin, H. Amrouch","doi":"10.23919/DATE56975.2023.10137162","DOIUrl":null,"url":null,"abstract":"In this work, we are the first to demonstrate how well-established EDA tool flows can be employed to upheave Self- Heating Effects (SHE) from individual devices at the transistor level all the way up to complete large circuits at the final layout (i.e., GDS-II) level. Transistor SHE imposes an ever-growing reliability challenge due to the continuous shrinking of geometries alongside the non-ideal voltage scaling in advanced technology nodes. The challenge is largely exacerbated when more confined 3D structures are adopted to build transistors such as upcoming Nanosheet FETs and Ribbon FETs. By employing increasingly-confined structures and materials of poorer thermal conductance, heat arising within the transistor's channel is trapped inside and cannot escape. This leads to accelerated defect generation and, if not considered carefully, a profound risk to IC reliability. Due to the lack of EDA tool flows that can consider SHE, circuit designers are forced to take pessimistic worst-case assumptions (obtained at the transistor level) to ensure reliability of the complete chip for the entire projected lifetime - at the cost of sub-optimal circuit designs and considerable efficiency losses. Our work paves the way for designers to estimate less pessimistic (i.e., small yet sufficient) safety margins for their circuits leading to higher efficiency without compromising reliability. Further, it provides new perspectives and opens new doors to estimate and optimize reliability correctly in the presence of emerging SHE challenge through identifying early the weak spots and failure sources across the design.","PeriodicalId":340349,"journal":{"name":"2023 Design, Automation & Test in Europe Conference & Exhibition (DATE)","volume":"36 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Upheaving Self-Heating Effects from Transistor to Circuit Level using Conventional EDA Tool Flows\",\"authors\":\"F. Klemme, Sami Salamin, H. Amrouch\",\"doi\":\"10.23919/DATE56975.2023.10137162\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, we are the first to demonstrate how well-established EDA tool flows can be employed to upheave Self- Heating Effects (SHE) from individual devices at the transistor level all the way up to complete large circuits at the final layout (i.e., GDS-II) level. Transistor SHE imposes an ever-growing reliability challenge due to the continuous shrinking of geometries alongside the non-ideal voltage scaling in advanced technology nodes. The challenge is largely exacerbated when more confined 3D structures are adopted to build transistors such as upcoming Nanosheet FETs and Ribbon FETs. By employing increasingly-confined structures and materials of poorer thermal conductance, heat arising within the transistor's channel is trapped inside and cannot escape. This leads to accelerated defect generation and, if not considered carefully, a profound risk to IC reliability. Due to the lack of EDA tool flows that can consider SHE, circuit designers are forced to take pessimistic worst-case assumptions (obtained at the transistor level) to ensure reliability of the complete chip for the entire projected lifetime - at the cost of sub-optimal circuit designs and considerable efficiency losses. Our work paves the way for designers to estimate less pessimistic (i.e., small yet sufficient) safety margins for their circuits leading to higher efficiency without compromising reliability. Further, it provides new perspectives and opens new doors to estimate and optimize reliability correctly in the presence of emerging SHE challenge through identifying early the weak spots and failure sources across the design.\",\"PeriodicalId\":340349,\"journal\":{\"name\":\"2023 Design, Automation & Test in Europe Conference & Exhibition (DATE)\",\"volume\":\"36 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-04-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2023 Design, Automation & Test in Europe Conference & Exhibition (DATE)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.23919/DATE56975.2023.10137162\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 Design, Automation & Test in Europe Conference & Exhibition (DATE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/DATE56975.2023.10137162","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

在这项工作中,我们首次展示了如何利用完善的EDA工具流来从晶体管级别的单个器件一直到最终布局(即GDS-II)级别的完整大型电路来提升自热效应(SHE)。由于几何形状的不断缩小以及先进技术节点的非理想电压缩放,晶体管SHE对可靠性提出了不断增长的挑战。当采用更有限的3D结构来制造晶体管(如即将推出的纳米片场效应管和带状场效应管)时,挑战很大程度上加剧了。通过使用越来越受限的结构和导热性较差的材料,晶体管沟道内产生的热量被困在里面,无法逸出。这将加速缺陷的产生,如果不仔细考虑,将对集成电路的可靠性造成严重的风险。由于缺乏可以考虑SHE的EDA工具流,电路设计人员被迫采取悲观的最坏情况假设(在晶体管级别获得),以确保整个预期寿命内整个芯片的可靠性-以次优电路设计和相当大的效率损失为代价。我们的工作为设计人员估计不那么悲观(即小而足够)的电路安全裕度铺平了道路,从而在不影响可靠性的情况下提高效率。此外,通过识别设计中的薄弱环节和故障来源,它提供了新的视角,并为在出现SHE挑战的情况下正确评估和优化可靠性打开了新的大门。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Upheaving Self-Heating Effects from Transistor to Circuit Level using Conventional EDA Tool Flows
In this work, we are the first to demonstrate how well-established EDA tool flows can be employed to upheave Self- Heating Effects (SHE) from individual devices at the transistor level all the way up to complete large circuits at the final layout (i.e., GDS-II) level. Transistor SHE imposes an ever-growing reliability challenge due to the continuous shrinking of geometries alongside the non-ideal voltage scaling in advanced technology nodes. The challenge is largely exacerbated when more confined 3D structures are adopted to build transistors such as upcoming Nanosheet FETs and Ribbon FETs. By employing increasingly-confined structures and materials of poorer thermal conductance, heat arising within the transistor's channel is trapped inside and cannot escape. This leads to accelerated defect generation and, if not considered carefully, a profound risk to IC reliability. Due to the lack of EDA tool flows that can consider SHE, circuit designers are forced to take pessimistic worst-case assumptions (obtained at the transistor level) to ensure reliability of the complete chip for the entire projected lifetime - at the cost of sub-optimal circuit designs and considerable efficiency losses. Our work paves the way for designers to estimate less pessimistic (i.e., small yet sufficient) safety margins for their circuits leading to higher efficiency without compromising reliability. Further, it provides new perspectives and opens new doors to estimate and optimize reliability correctly in the presence of emerging SHE challenge through identifying early the weak spots and failure sources across the design.
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