双掺杂:一种降低LEC InP晶体位错密度的方法

B.A. Dedavid, R. Fornari, M. Moriglioni, J. Kumar, S. Anbukumar, M. Taddia, M. Battagliarin, E. Sentimenti
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引用次数: 0

摘要

本文报道了通过与CdTe共掺杂生长低位错密度、低载流子浓度的p型InP。采用液体包封法(LEC)生长了4个晶体。电学和分析研究的结果表明,镉和碲在拉伸前都会发生一些化学反应,因此只有一小部分添加的杂质可用于掺杂。通过对四种低自由载流子浓度晶体的结构研究,证实了这种共掺杂在降低位错密度方面的有效性。讨论了多重掺杂作为位错还原策略的作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Double doping: A method to decrease dislocation densities in LEC InP crystals
The authors report on the growth of low-dislocation density low-carrier concentration p-type InP via codoping with CdTe. Four crystals were grown by the liquid encapsulated Czochralski (LEC) technique. The results of electrical and analytical studies suggest that both cadmium and tellurium undergo some chemical reactions before pulling, so that only a minor fraction of the added impurities is available for doping. The effectiveness of this codoping in terms of dislocation density reduction has been confirmed by the structural investigations carried out on the four crystals with low free carrier concentrations. The role of multiple doping as a strategy for dislocation reduction is discussed.<>
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