基于原子力显微镜和光刻技术制备PCSS

Qinggang Liu, Kai Zhang, Jindong Xin, Xiaotang Hu
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引用次数: 0

摘要

在覆盖在GaAs衬底上的3~5nm厚的Ti线表面制备了几条10纳米宽的TiOx线。采用原子力显微镜(AFM)制备TiOx线,采用光刻法制备Ti线。氧化物被用作电极之间的绝缘体/能量屏障,以取代传统类型的光导半导体开关(PCSS)的气隙。电极和衬底材料分别为Ti-Au和LT-GaAs。仿真结果表明,PCSS的电压或电流输出特性不同于传统开关。本文对这种现象进行了分析,并讨论了避免这种非线性输出的方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fabrication of PCSS Based on AFM and Photolithograph
Several ten nanometers width TiOx wires was fabricated on the surface of 3~5nm thick Ti lines which covers GaAs substrate. TiOx wires are fabricated by atomic force microscope (AFM), and the Ti lines are fabricated by photolithograph method. Oxide is used as insulator/energy barrier between the electrodes to substitute the air gap of traditional type photoconductive semiconductive switches (PCSS). The electrodes and substrate's materials are Ti-Au and LT-GaAs respectively. The simulation result indicated that the voltage or current output characteristic of the PCSS is different from the traditional switch. In this paper, this phenomenon is analyzed and the method to avoid such kind of non-linearity output is discussed.
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