MEMS开关金镍触点氧化镍膜的有限元建模

Hong Liu, D. Leray, S. Colin, P. Pons
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引用次数: 2

摘要

接触表面的污染和氧化是不可避免的,特别是在低负载(μN-mN)下的微接触。它们被认为是高接触电阻的主要原因,并可能导致接触故障。然而,由于薄膜的形成是一个复杂的现象,很难准确地观察和表征薄膜的性质。本文建立了MEMS开关金镍触点的氧化镍膜有限元模型。考虑到电接触面积只是机械接触面积的一部分,建立了所谓的“纳米斑点”模型:多个小的导电斑点分散在一个大的机械接触表面上,纳米斑点周围有超薄的氧化膜。电斑的大小和机械粗糙度分别由测量的电阻和机械接触模型推导出来。仿真结果与实验结果吻合较好。该模型使我们能够确定一些可能的接触表面几何构型,从而导致实际设备中测量的接触电阻。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Finite element modeling of nickel oxide film for Au-Ni contact of MEMS switches
Contamination and oxidation are inevitable in contact surfaces, especially for micro contact under low load (μN-mN). They are considered as major causes for a high contact resistance, and can lead to the failure of a contact. However, as the film formation is a complex phenomenon, it is difficult to accurately observe and characterize the film properties. In this paper, a finite element model of nickel oxide film is developed for Au-Ni contact of MEMS switches. Considering the fact that the electrical contact area is only a portion of the mechanical contact area, a so-called `nano-spots' model is developed: multiple small conductive spots are scattered on a large mechanical contact asperity, and ultrathin oxide film is located around the nano-spots. The sizes of the electrical spots and the mechanical asperity are deduced from the measured electrical resistance and a mechanical contact modeling, respectively. The simulations results show a good agreement with the experimental results. This model allows us to determine some possible geometrical configurations of contact surfaces that lead to the measured contact resistance in real devices.
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