氮化镓基异质结构中低场和高场电子输运的蒙特卡罗研究

J. Thobel, F. Dessenne, C. Dalle
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引用次数: 1

摘要

利用蒙特卡罗模型研究了氮化镓基异质结构的电子输运性质,该模型考虑了多个谷中的大量子带。在考虑声子散射屏蔽的情况下,得到了与实验结果一致的室温低场迁移率。在本征异质结构中,迁移率总是大于体氮化镓。位错在低电子密度下强烈地降低迁移率。此外,还研究了300 kV/cm强电场下的输运。当电子密度增加时,峰值速度降低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Monte Carlo study of low and high-field electron transport in GaN-based heterostructures
Electron transport properties of GaN-based heterostructures are investigated by means of a Monte Carlo model, which considers a large number of subbands in several valleys. Room-temperature low-field mobility consistent with experimental results is obtained provided that screening of phonon scattering is accounted for. In intrinsic heterostructures the mobility is always greater than in bulk GaN. Dislocations strongly reduce mobility at low electron density. Transport under applied field up to 300 kV/cm is also investigated. The peak velocity is found to decrease when electron density is increased.
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