基于碳纳米管电路的全芯片功率/性能优势

Taigon Song, S. Lim
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引用次数: 0

摘要

作为互补金属氧化物半导体(CMOS)技术的潜在替代品,许多研究人员正在关注用于未来电子产品的碳纳米管场效应晶体管(cnfet)。然而,现有的研究报告了cnfet在器件级通过使用小规模电路或过时的CMOS技术而优于CMOS的优势。在本文中,我们提出了一种分析基于cnfet的电路的方法,并研究了它在全芯片尺度上的影响。首先,我们设计了CNFET标准单元,并使用它们来构建大规模设计。其次,我们对CNFET器件进行寄生提取,并表征其时序和功率行为。然后,我们进行了全芯片分析,并展示了CNFET在45纳米和20纳米设计中优于CMOS的优点。我们的全芯片研究表明,在45纳米设计中,当密度为200 CNTs/μm时,CNFET电路比CMOS电路实现了5.91 x /3.87 x(延迟/功率)的优势。在20nm设计中,当密度为200 CNTs/μm时,CNFET的延迟/功率比CMOS高6.44倍/3.01倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Full-Chip Power/Performance Benefits of Carbon Nanotube-Based Circuits
As a potential alternative to the complementary metal-oxide semiconductor (CMOS) technology, many researchers are focusing on carbon-nanotube field-effect transistors (CNFETs) for future electronics. However, existing studies report the advantages of CNFETs over CMOS at the device level by using small-scale circuits, or over outdated CMOS technology. In this paper, we propose a methodology of analyzing CNFET-based circuits and study its impact at the full-chip scale. First, we design CNFET standard cells and use them to construct large-scale designs. Second, we perform parasitic extraction of CNFET devices and characterize their timing and power behaviors. Then, we perform a full-chip analysis and show the benefits of CNFET over CMOS in 45-nm and 20-nm designs. Our full-chip study shows that in the 45-nm design, CNFET circuits achieve a 5.91×/3.87× (delay/power) benefit over CMOS circuits at a density of 200 CNTs/μm. In the 20-nm design, CNFET achieves a 6.44×/3.01× (delay/power) benefit over CMOS at a density of 200 CNTs/μm.
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