YBa2Cu3O7-.DELTA的结晶度。微波器件中各种缓冲层的薄膜

M. Mukaida, Yuya Yamazaki, Y. Shingai, M. Kusunoki, K. Matsumoto, Y. Yoshida, A. Ichinose, S. Horii, A. Saito, S. Ohshima
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引用次数: 0

摘要

从YBa2Cu3O7−δ薄膜结晶度的角度研究了在MgO衬底上生长YBa2Cu3O7−δ薄膜的缓冲层材料。使用准分子激光生长缓冲层。采用x射线衍射、x射线摇摆曲线和x射线φ扫描等方法对MgO衬底上生长的缓冲层和缓冲层上的YBa2Cu3O7−δ薄膜的结晶度进行了评价。在MgO衬底上获得最高质量的YBa2Cu3O7−δ薄膜的关键之一是使用与MgO衬底晶格匹配的BaZrO3缓冲层。然而,这里所检查的每个缓冲层都显示出高质量的YBa2Cu3O7−δ薄膜,Tc约为89 K,表面电阻低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Crystallinity of YBa2Cu3O7-.DELTA. Thin Films on Various Buffer Layers for Microwave Devices
Buffer layer materials for growing YBa2Cu3O7−δ thin films on MgO substrates are examined from the viewpoint of YBa2Cu3O7−δ thin-film crystallinity. The buffer layers were grown using an excimer laser. Crystallinity of the buffer layers grown on MgO substrates and the YBa2Cu3O7−δ thin films on the buffer layers were evaluated by X-ray diffraction, X-ray rocking curves and X-ray φ-scan methods. One of key points to obtain YBa2Cu3O7−δ thin films of the highest quality on the MgO substrates is the usage of BaZrO3 buffer layers that are lattice matched to the MgO substrates. However, every buffer layer examined here showed the result of high-quality YBa2Cu3O7−δ thin films with a Tc of around 89 K and low surface resistance.
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