优化AIGaN/GaN HFET设计,提高效率

C. Roff, A. Sheikh, J. Benedikt, P. Tasker, K. Hilton, J. O. Maclean, D. Hayes, M. Uren, T. Martin
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引用次数: 4

摘要

本文使用测量波形来演示如何优化GaN HFET PA设计,以实现高功率和高效率。在功率密度为3 Wmm-4时,效率值达到80%。设计程序显示了波形工程,即射频电流和电压波形测量,偏置控制和有源谐波负载-拉力的组合,如何实现最大性能。还解释了器件输出电容在利用大电压波动的GaN设计中的重要作用,并提出了一种限制cd5影响的简单方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optimising AIGaN/GaN HFET designs for high efficiency
This paper uses measured waveforms to demonstrate how to optimise GaN HFET PA designs in order to achieve high power and high efficiency. Efficiency values of 80% were achieved at a power density of 3 Wmm-4. The design procedure shows how waveform engineering, i.e. a combination of RF current and voltage waveform measurements, bias control and active harmonic load-pull, allow maximum performance to be achieved. The significant role of the device output capacitance in GaN designs that utilise large voltage swings is also explained, and a simple method for limiting the effect of Cds 5 is presented.
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