电子束光刻技术制备微偏振片

2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) Pub Date : 2016-07-01 DOI:10.1109/3M-NANO.2016.7824986

Yinxue Fan, M. Yu, Shuyi Li, Zuobin Wang, Zhengxun Song

{"title":"电子束光刻技术制备微偏振片","authors":"Yinxue Fan, M. Yu, Shuyi Li, Zuobin Wang, Zhengxun Song","doi":"10.1109/3M-NANO.2016.7824986","DOIUrl":null,"url":null,"abstract":"A method for the fabrication of micropolarizer arrays by electron beam lithography was presented. The experimental results have illustrated the influences of exposure dose on the performance parameters of wire grids. The maximum transmittance and extinction ratios of wire grid arrays were obtained in the visible spectrum and the comparison results of the different depths of wire grids demonstrate the superiority of high depths. The performance of the two structures has shown that this work offers the possibility to improve the properties of the micropolarizers.","PeriodicalId":273846,"journal":{"name":"2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","volume":"24 4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Fabrication of micropolarizers by electron beam lithography\",\"authors\":\"Yinxue Fan, M. Yu, Shuyi Li, Zuobin Wang, Zhengxun Song\",\"doi\":\"10.1109/3M-NANO.2016.7824986\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A method for the fabrication of micropolarizer arrays by electron beam lithography was presented. The experimental results have illustrated the influences of exposure dose on the performance parameters of wire grids. The maximum transmittance and extinction ratios of wire grid arrays were obtained in the visible spectrum and the comparison results of the different depths of wire grids demonstrate the superiority of high depths. The performance of the two structures has shown that this work offers the possibility to improve the properties of the micropolarizers.\",\"PeriodicalId\":273846,\"journal\":{\"name\":\"2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)\",\"volume\":\"24 4 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/3M-NANO.2016.7824986\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/3M-NANO.2016.7824986","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

提出了一种利用电子束光刻技术制备微偏振器阵列的方法。实验结果说明了辐照剂量对线栅性能参数的影响。得到了线栅阵列在可见光光谱中的最大透射比和消光比，不同深度线栅阵列的对比结果表明了高深度线栅阵列的优势。这两种结构的性能表明，这项工作为改善微偏振器的性能提供了可能性。

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Fabrication of micropolarizers by electron beam lithography

A method for the fabrication of micropolarizer arrays by electron beam lithography was presented. The experimental results have illustrated the influences of exposure dose on the performance parameters of wire grids. The maximum transmittance and extinction ratios of wire grid arrays were obtained in the visible spectrum and the comparison results of the different depths of wire grids demonstrate the superiority of high depths. The performance of the two structures has shown that this work offers the possibility to improve the properties of the micropolarizers.

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来源期刊

2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)

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