{"title":"采用各种抛光技术加工的熔融二氧化硅表层","authors":"Yaguo Li, Zhichao Liu, R. Xie, Jian Wang, Qiao Xu","doi":"10.1109/SOPO.2010.5504288","DOIUrl":null,"url":null,"abstract":"Our recent experiments show that the surface layer of fused silica manufactured by the magnetorheological finishing(MRF) is different from those finished by conventional polishing technique (e.g. pitch polishing or polyurethane polishing) in mechanical properties. We examined the hardness of the surface layer on fused silica polished by pitch/pad polishing and MRF respectively, and the results indicate that the hardness of traditionally polished layer is smaller than bulk material, decreasing with the distance from the sample surface, while the nanohardness of MRF-manufactured sample is greater than bulk, gradually increasing to the bulk value. We attribute the differences to the unique material removal mechanism of MRF. The distinctions among these polishing techniques may make contribution to varied laser-induced breakdown topography.","PeriodicalId":155352,"journal":{"name":"2010 Symposium on Photonics and Optoelectronics","volume":"111 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-06-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"The Surface Layer of Fused Silica Finished by Various Polishing Techniques\",\"authors\":\"Yaguo Li, Zhichao Liu, R. Xie, Jian Wang, Qiao Xu\",\"doi\":\"10.1109/SOPO.2010.5504288\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Our recent experiments show that the surface layer of fused silica manufactured by the magnetorheological finishing(MRF) is different from those finished by conventional polishing technique (e.g. pitch polishing or polyurethane polishing) in mechanical properties. We examined the hardness of the surface layer on fused silica polished by pitch/pad polishing and MRF respectively, and the results indicate that the hardness of traditionally polished layer is smaller than bulk material, decreasing with the distance from the sample surface, while the nanohardness of MRF-manufactured sample is greater than bulk, gradually increasing to the bulk value. We attribute the differences to the unique material removal mechanism of MRF. The distinctions among these polishing techniques may make contribution to varied laser-induced breakdown topography.\",\"PeriodicalId\":155352,\"journal\":{\"name\":\"2010 Symposium on Photonics and Optoelectronics\",\"volume\":\"111 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-06-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 Symposium on Photonics and Optoelectronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SOPO.2010.5504288\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 Symposium on Photonics and Optoelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOPO.2010.5504288","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The Surface Layer of Fused Silica Finished by Various Polishing Techniques
Our recent experiments show that the surface layer of fused silica manufactured by the magnetorheological finishing(MRF) is different from those finished by conventional polishing technique (e.g. pitch polishing or polyurethane polishing) in mechanical properties. We examined the hardness of the surface layer on fused silica polished by pitch/pad polishing and MRF respectively, and the results indicate that the hardness of traditionally polished layer is smaller than bulk material, decreasing with the distance from the sample surface, while the nanohardness of MRF-manufactured sample is greater than bulk, gradually increasing to the bulk value. We attribute the differences to the unique material removal mechanism of MRF. The distinctions among these polishing techniques may make contribution to varied laser-induced breakdown topography.