采用各种抛光技术加工的熔融二氧化硅表层

Yaguo Li, Zhichao Liu, R. Xie, Jian Wang, Qiao Xu
{"title":"采用各种抛光技术加工的熔融二氧化硅表层","authors":"Yaguo Li, Zhichao Liu, R. Xie, Jian Wang, Qiao Xu","doi":"10.1109/SOPO.2010.5504288","DOIUrl":null,"url":null,"abstract":"Our recent experiments show that the surface layer of fused silica manufactured by the magnetorheological finishing(MRF) is different from those finished by conventional polishing technique (e.g. pitch polishing or polyurethane polishing) in mechanical properties. We examined the hardness of the surface layer on fused silica polished by pitch/pad polishing and MRF respectively, and the results indicate that the hardness of traditionally polished layer is smaller than bulk material, decreasing with the distance from the sample surface, while the nanohardness of MRF-manufactured sample is greater than bulk, gradually increasing to the bulk value. We attribute the differences to the unique material removal mechanism of MRF. The distinctions among these polishing techniques may make contribution to varied laser-induced breakdown topography.","PeriodicalId":155352,"journal":{"name":"2010 Symposium on Photonics and Optoelectronics","volume":"111 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-06-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"The Surface Layer of Fused Silica Finished by Various Polishing Techniques\",\"authors\":\"Yaguo Li, Zhichao Liu, R. Xie, Jian Wang, Qiao Xu\",\"doi\":\"10.1109/SOPO.2010.5504288\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Our recent experiments show that the surface layer of fused silica manufactured by the magnetorheological finishing(MRF) is different from those finished by conventional polishing technique (e.g. pitch polishing or polyurethane polishing) in mechanical properties. We examined the hardness of the surface layer on fused silica polished by pitch/pad polishing and MRF respectively, and the results indicate that the hardness of traditionally polished layer is smaller than bulk material, decreasing with the distance from the sample surface, while the nanohardness of MRF-manufactured sample is greater than bulk, gradually increasing to the bulk value. We attribute the differences to the unique material removal mechanism of MRF. The distinctions among these polishing techniques may make contribution to varied laser-induced breakdown topography.\",\"PeriodicalId\":155352,\"journal\":{\"name\":\"2010 Symposium on Photonics and Optoelectronics\",\"volume\":\"111 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-06-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 Symposium on Photonics and Optoelectronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SOPO.2010.5504288\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 Symposium on Photonics and Optoelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOPO.2010.5504288","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

摘要

我们最近的实验表明,磁流变抛光(MRF)制备的熔融二氧化硅表面层的机械性能与传统抛光技术(如沥青抛光或聚氨酯抛光)的不同。研究了沥青/垫块抛光和磁流变液抛光后的石英表面硬度,结果表明:传统抛光后的石英表面硬度小于块状材料,随着与样品表面距离的增加而减小;磁流变液抛光后的石英表面硬度大于块状材料,并逐渐增大到块状材料。我们将这种差异归因于磁流变液独特的材料去除机制。这些抛光技术之间的差异可能导致不同的激光诱导击穿形貌。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The Surface Layer of Fused Silica Finished by Various Polishing Techniques
Our recent experiments show that the surface layer of fused silica manufactured by the magnetorheological finishing(MRF) is different from those finished by conventional polishing technique (e.g. pitch polishing or polyurethane polishing) in mechanical properties. We examined the hardness of the surface layer on fused silica polished by pitch/pad polishing and MRF respectively, and the results indicate that the hardness of traditionally polished layer is smaller than bulk material, decreasing with the distance from the sample surface, while the nanohardness of MRF-manufactured sample is greater than bulk, gradually increasing to the bulk value. We attribute the differences to the unique material removal mechanism of MRF. The distinctions among these polishing techniques may make contribution to varied laser-induced breakdown topography.
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