UV Lithographic Patterning on Spin-coated DNA Thin-films

Photopatterning with 266 nm UV light was accomplished on spin-coated DNA thin films using two different techniques. Lithographic masks were used to create 10-100 micron-sized arrays of enhanced hydrophilicity. Two such masks were used: (1) Polka Dot Filter having opaque squares and a transparent grid and (2) A metal wire-mesh having transparent squares and opaque grid. UV light selectively photodissociates the DNA film where it is exposed into smaller more hydrophilic fragments. UV-exposed films are then coated with a solution of a protein. The protein appears to selectively coat over areas exposed to UV light. We have also used interferometric lithography with UV light to accomplish patterning on the scale of 1 micron on DNA thin films. This technique has the potential to generate micro/nano arrays and vary the array-size. This paper describes the fabrication of these microarrays and a plausible application for fabricating antibody arrays for protein sensing applications.