如何应对单片3D集成电路顶层的慢速晶体管:设计研究和CAD解决方案

S. Samal, D. Nayak, M. Ichihashi, S. Banna, S. Lim
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引用次数: 7

摘要

本文研究了低热预算工艺对单片三维集成电路(M3D)设计质量的影响。具体来说,我们量化了在14纳米FinFET技术中,层对层晶体管性能差异对全芯片功率和性能指标的影响程度。我们的研究首先表明,在以线为主导、时序封闭的单片3D IC设计中,5%、10%和15%的顶级器件退化分别导致7%、12%和18%的全芯片时序违规。接下来,我们使用名为分层感知M3D (TA-M3D)流的CAD解决方案来解决这种影响,该解决方案识别潜在的时间关键路径,并将它们划分到更快的(底层)层,以最大限度地减少顶层的退化影响。在这种情况下,计时闭包的一个独特挑战是如何对完全位于顶层或底层以及跨越两层的路径进行缓冲和调整大小。我们的方法仔细处理所有三种类型的路径,并在给定的顶层退化假设下关闭时序,同时最小化总功耗。我们的增强型单片3D IC设计,即使在顶级晶体管中速度慢5%,10%和15%,仍然比2D IC分别节省26%,24%和5%的功耗。我们的研究也涵盖了其他类型的电路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
How to Cope with Slow Transistors in the Top-tier of Monolithic 3D ICs: Design Studies and CAD Solutions
In this paper we study the impact of low thermal budget process on design quality in monolithic 3D ICs (M3D). Specifically, we quantify how much the tier-to-tier transistor performance difference affects full-chip power and performance metrics in a foundry 14nm FinFET technology. Our study first shows that 5%, 10%, and 15% top-tier device degradation in a wire-dominated, timing-closed monolithic 3D IC design leads to 7%, 12%, and 18% full-chip timing violation, respectively. Next, we address this impact with our CAD solution named Tier-Aware M3D (TA-M3D) flow that identifies potential timing-critical paths and partitions them into the faster (bottom) tier to minimize the top-tier degradation impact. One unique challenge in timing closure in this case, is how to conduct buffering and sizing on the paths that lie entirely in the top or bottom-tier as well as those that span both tiers. Our approach handles all 3 types of paths carefully and closes timing under the given top-tier degradation assumption, while minimizing the total power consumption. Our enhanced monolithic 3D IC designs, even with 5%, 10%, and 15% slower transistors in the top-tier, still offers 26%, 24%, and 5% power savings over 2D IC, respectively. Our study also covers other types of circuits.
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