从原子尺度的界面到新的纳米材料

N. Plusnin
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引用次数: 0

摘要

提出了以亚纳米非均质纳米涂层形式合成新型纳米材料的问题。本文分析了在超高真空条件下物理气相沉积对薄膜与衬底混合过程的影响,包括在过渡金属-硅界面形成条件下得到的结果。实验结果的推广为开发具有低维非均质性的新型纳米涂层开辟了一条途径。讨论了低维纳米涂层的制备原理、性能和应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
From atomic-scale interfaces — To new nanomaterials
The problem of the synthesis of new type nanomaterials in the form of nano-coatings with sub-nanometric heterogeneity has been formulated. It has been presented an analysis of influences of physical vapor deposition in ultrahigh vacuum on the process of intermixing a film with a substrate, including the results, which has been obtained under the formation of transition metal – silicon interface. The generalization of the obtained experimental results develops an approach to the development of new nano-coatings with low-dimensional heterogeneity. The principles of constructing such low-dimensional nano-coatings, their properties and possible applications are considered. 
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