{"title":"一种基于模式的图像绘制中伪影减少的快速空间斑块混合算法","authors":"M. Daisy, D. Tschumperlé, O. Lézoray","doi":"10.1145/2542355.2542365","DOIUrl":null,"url":null,"abstract":"We propose a fast and generic spatial patch blending technique that can be embedded within any kind of pattern-based inpainting algorithm. This extends our previous work on the visual enhancement of inpainting results. We optimize this blending algorithm so that the processing time is roughly divided by a factor ten, without any loss of perceived quality. Moreover, we provide an open-source and simple-to-use software to make this easily reproducible.","PeriodicalId":232593,"journal":{"name":"SIGGRAPH Asia 2013 Technical Briefs","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-11-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"31","resultStr":"{\"title\":\"A fast spatial patch blending algorithm for artefact reduction in pattern-based image inpainting\",\"authors\":\"M. Daisy, D. Tschumperlé, O. Lézoray\",\"doi\":\"10.1145/2542355.2542365\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We propose a fast and generic spatial patch blending technique that can be embedded within any kind of pattern-based inpainting algorithm. This extends our previous work on the visual enhancement of inpainting results. We optimize this blending algorithm so that the processing time is roughly divided by a factor ten, without any loss of perceived quality. Moreover, we provide an open-source and simple-to-use software to make this easily reproducible.\",\"PeriodicalId\":232593,\"journal\":{\"name\":\"SIGGRAPH Asia 2013 Technical Briefs\",\"volume\":\"12 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-11-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"31\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"SIGGRAPH Asia 2013 Technical Briefs\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1145/2542355.2542365\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"SIGGRAPH Asia 2013 Technical Briefs","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1145/2542355.2542365","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A fast spatial patch blending algorithm for artefact reduction in pattern-based image inpainting
We propose a fast and generic spatial patch blending technique that can be embedded within any kind of pattern-based inpainting algorithm. This extends our previous work on the visual enhancement of inpainting results. We optimize this blending algorithm so that the processing time is roughly divided by a factor ten, without any loss of perceived quality. Moreover, we provide an open-source and simple-to-use software to make this easily reproducible.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
