先进微电子技术中的辐射效应

A. Johnston
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引用次数: 134

摘要

近年来,设备扩展的速度迅速增加。已经生产出特征尺寸小于0.1 /spl mu/m的实验CMOS器件,表明特征尺寸在0.1 - 0.25 /spl mu/m之间的器件将在2000年以后成为主流技术。本文讨论了器件尺寸和设计的预期变化如何影响其在空间环境中的辐射响应。讨论了总剂量效应、单原子效应和闭锁等传统问题,以及新现象。后者包括来自重离子的硬错误(微剂量和门破裂错误),以及与先进电路结构相关的复杂失效模式。本文的主要重点是商业设备,它们在许多空间应用中取代了硬化设备技术。然而,设备缩放对硬化设备的影响也进行了讨论。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Radiation effects in advanced microelectronics technologies
The pace of device scaling has increased rapidly in recent years. Experimental CMOS devices have been produced with feature sizes below 0.1 /spl mu/m, demonstrating that devices with feature sizes between 0.1 and 0.25 /spl mu/m will likely be available in mainstream technologies after the year 2000. This paper discusses how the anticipated changes in device dimensions and design are likely to affect their radiation response in space environments. Traditional problems, such as total dose effects, SEU and latchup are discussed, along with new phenomena. The latter include hard errors from heavy ions (microdose and gate-rupture errors), and complex failure modes related to advanced circuit architecture. The main focus of the paper is on commercial devices, which are displacing hardened device technologies in many space applications. However, the impact of device scaling on hardened devices is also discussed.
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