二维微机械加速度计

Proceedings of Third International Conference on Electronics, Circuits, and Systems Pub Date : 1996-10-13 DOI:10.1109/ICECS.1996.584532

H. Ahmad, A. Al-Khalili, L. Landsberger, M. Kahrizi

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引用次数: 5

摘要

设计并实现了一种表面微加工二维加速度计。该实现需要在市售的标准CMOS工艺中添加三个屏蔽步骤。它的全量程读数为/spl plusmn/ 100g，在此范围内线性度优于1%，灵敏度为0.5 mV/g。信号检测电路是片上开关电容电荷转移电路，在内部生成的1 MHz四相非重叠时钟上工作。

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A 2D micromachined accelerometer

A surface micromachined 2-D accelerometer is designed and implemented in CMOS. The implementation requires the addition of three masking steps to a commercially available standard CMOS process. It has a /spl plusmn/100 g full range reading and better than 1% linearity within this range with a sensitivity of 0.5 mV/g. The signal detection circuitry is an on-chip switched capacitor charge transfer circuit operating on an internally generated 1 MHz four-phase non-overlapping clock.

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Proceedings of Third International Conference on Electronics, Circuits, and Systems

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