AlGaN/GaN基HEMT直流和射频性能分析

Tanmoy De, M. Mohapatra, A. K. Panda
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引用次数: 5

摘要

本文设计了一种栅极长度为3 μm的AlGaN/GaN基高电子迁移率晶体管,并利用Silvaco TCAD软件对其进行了仿真。当栅极电压为2.5 V时,漏极电流为658 mA/mm。在栅极电压为2V时,器件的跨导率为123 mS/mm。漏极电压为45v时,最大输出电导为163ms /mm。计算该器件的栅极到源极和栅极到漏极电容。设备的截止频率为2.6 GHz,设备的最大振荡频率为9.8 GHz。工作频率为5ghz时,最小噪声系数为11.6 dB。器件的固有时延为122 ps。这些特性证明了基于AlGaN/GaN的HEMT是高功率应用和微波应用的完美选择。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
DC and RF performance analysis of AlGaN/GaN based HEMT
In this work, a AlGaN/GaN based High Electron Mobility Transistor with 3 μm gate length is designed and simulated with the Silvaco TCAD software which is passivated by SiO2. A drain current of 658 mA/mm is found for a gate voltage of 2.5 V. The transconductance of the device is 123 mS/mm at the gate voltage of 2V. A maximum output conductance of 163 mS/mm is obtained at the drain voltage of 45 V. The gate to source and gate to drain capacitance is calculated for the device. The cutoff frequency of the device is 2.6 GHz and the maximum frequency oscillation of the device is 9.8 GHz. A minimum noise figure of 11.6 dB is obtained at the operating frequency 5 GHz. Intrinsic time delay of the device is 122 ps. These properties prove that the AlGaN/GaN based HEMT is perfect for high power applications as well as microwave applications.
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