从下加热的水平通道中共轭传热的实验与数值研究:在CVD加工中的应用

W. Chiu, C. J. Richards, Y. Jaluria
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摘要

本文对模拟化学气相沉积(CVD)工艺的水平通道加热段的共轭传热进行了详细的实验和数值研究。由于薄膜质量、均匀性和沉积速率对温度有很强的依赖性,因此在薄膜生产中,共轭传热对温度分布的影响是非常重要的。从本研究中获得的实验数据提供了对共轭传热效应的物理见解,并允许对数值共轭传热模型进行比较和验证。研究了流动和热输运的基本特性。该数值模型用于执行操作参数的参数化研究,允许表征共轭传热对感受器表面、反应器壁和气相温度的影响。该研究为CVD反应器的热设计提供了有价值的指导。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Experimental and Numerical Study of Conjugate Heat Transfer in a Horizontal Channel Heated From Below: Applications to CVD Processing
A detailed experimental and numerical study is carried out to investigate conjugate heat transfer in a horizontal channel with a heated section which simulates Chemical Vapor Deposition (CVD) processing. Since film quality, uniformity and deposition rate have strong dependence on temperature, the role of conjugate heat transfer in influencing temperature distribution is significant in thin film production. Experimental data obtained from this study provides physical insight into conjugate heat transfer effects and allows for comparison and validation of numerical conjugate heat transfer models. The basic characteristics of the flow and the thermal transport are studied. The numerical model is used to perform a parametric study of operational parameters, allowing for the characterization of conjugate heat transfer effects on temperature at the susceptor surface, reactor walls and the gas phase. The study yields valuable guidelines for the thermal design of CVD reactors.
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