在3D-IC集成方面,beol开裂和分层研究的相互作用积分和模式分离

J. Auersperg, R. Dudek, J. Oswald, B. Michel
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引用次数: 9

摘要

随着微电子领域功能密度和微型化的不断提高,新型低k和超低k材料将越来越多地用于先进CMOS技术的后端(BEoL)层。这些持续的趋势,以及向使用tsv进行3d - ic集成的过渡,给相关电子组件的可靠性分析和预测带来了新的挑战。优化这些BEoL结构在制造/封装(特别是无铅回流焊期间)以及芯片封装相互作用(CPI)方面的抗断裂和抗疲劳性能是进一步增强的关键——参见[1]。特别是在这种情况下,需要改进对双材料界面分层风险的评估以及材料的破坏和开裂。先进的有限元技术结合实验观察和验证的应用,提供了一种获得更多基本知识的方法,最终,理解,预测和预防可靠性问题。然而,开裂和分层风险评估滞后于需求,特别是对于双材料界面断裂的非线性、瞬态、热载荷。此时,双材料界面裂纹处正确的模态混合分离是正确评估分层风险的前提。然而,已知不同的方法取决于网格密度,集成路径和/或参考长度。我们讨论了在多尺度和多破坏建模方法中使用VCCT和整体断裂概念来处理大块和双材料界面断裂。将研究和比较不同方法的能量释放率(ERR)、应力强度因子(SIF)和相关相位角。本文将指出并验证它们之间的解析关系。因此,本文讨论了参考长度、归一化长度和路径依赖对断裂参数计算的作用。最后讨论了与BEoL结构开裂风险相关的断裂参数的影响。作者将这些数值方法与实验结果相结合,以优化大块材料断裂和界面分层的韧性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Interaction integral and mode separation for BEoL-cracking and -delamination investigations under 3D-IC integration aspects
As a consequence of increasing functional density and miniaturization in microelectronics new low-k and ultra-low-k materials are going to be increasingly used in Back-end of line (BEoL) layers of advanced CMOS technologies. These ongoing trends together with the transition to the use of TSVs for 3D-IC-integration cause novel challenges for reliability analysis and prediction of relevant electronics assemblies. The optimization of fracture and fatigue resistance of those BEoL structures under manufacturing/packaging (during lead-free reflow-soldering, in particular) as well as chip package interaction (CPI) aspects is a key for further enhancements - see also [1]. In particular in this context the evaluation of the risk of delamination at bi-material interfaces and damaging and cracking of materials needs to be improved. The application of advanced finite element techniques combined with experimental observations and validations, provide a way to gain more fundamental knowledge and ultimately, to understand, predict and prevent reliability issues. However, cracking and delamination risk evaluations hang behind the needs - especially for nonlinear, transient, thermal loading of bi-material interface fracture. At this point, the correct mode mixity separation at bi-material interface cracks is a precondition for proper delamination risk evaluation. However, different approaches are known to be dependent on mesh density, integration path and/or reference length. We discuss the use of VCCT and integral fracture concepts for bulk and bi-material interface fracture in multi-scale and multi-failure modeling approaches. Energy release rate (ERR), stress intensity factors (SIF) and the related phase angles as results of the different approaches will be investigated and compared. Analytic relations between them will be pointed out and verified. Therefore, the frequently investigated role of reference length, normalizing length and path dependence for the calculation of the fracture parameters is discussed. Effects on the fracture parameters are finally discussed related to the cracking risk of BEoL structures. The authors combine these numerical approaches with experimental results in order to optimize the toughness for bulk material fracture and interface delamination with regard to structural modifications.
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