{"title":"提出了一种紫外光刻系统的概念,并对其后部进行了人工智能启动设计","authors":"I. Livshits, N. Zoric","doi":"10.5220/0005688500820086","DOIUrl":null,"url":null,"abstract":"This paper describes a concept for designing a projection lens in lithographic optical system for 365 nm. Our approach for meeting this objective is to use the starting design obtained by artificial intelligence mode in Synopsys software. The proposed method describes the steps of getting a desired starting point of the optical system and the optimization problems in the optical system with a high numerical aperture.","PeriodicalId":222009,"journal":{"name":"2016 4th International Conference on Photonics, Optics and Laser Technology (PHOTOPTICS)","volume":"45 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-12-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"A concept of ultraviolet lithography system and design of its rear part using artificial intelligence for starting design\",\"authors\":\"I. Livshits, N. Zoric\",\"doi\":\"10.5220/0005688500820086\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper describes a concept for designing a projection lens in lithographic optical system for 365 nm. Our approach for meeting this objective is to use the starting design obtained by artificial intelligence mode in Synopsys software. The proposed method describes the steps of getting a desired starting point of the optical system and the optimization problems in the optical system with a high numerical aperture.\",\"PeriodicalId\":222009,\"journal\":{\"name\":\"2016 4th International Conference on Photonics, Optics and Laser Technology (PHOTOPTICS)\",\"volume\":\"45 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-12-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 4th International Conference on Photonics, Optics and Laser Technology (PHOTOPTICS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.5220/0005688500820086\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 4th International Conference on Photonics, Optics and Laser Technology (PHOTOPTICS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.5220/0005688500820086","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A concept of ultraviolet lithography system and design of its rear part using artificial intelligence for starting design
This paper describes a concept for designing a projection lens in lithographic optical system for 365 nm. Our approach for meeting this objective is to use the starting design obtained by artificial intelligence mode in Synopsys software. The proposed method describes the steps of getting a desired starting point of the optical system and the optimization problems in the optical system with a high numerical aperture.