{"title":"光学薄膜中激光诱导的热应力","authors":"A. Firth, U. Srinivasan","doi":"10.1364/OIC.2019.THB.8","DOIUrl":null,"url":null,"abstract":"Thermal stress of optical thin film materials SiO2, HfO2, Al2O3, TiO2, and MgF2 exposed to laser pulse is simulated using 2D finite element method. Thermal stress is compressive and MgF2 film has the least value.","PeriodicalId":119323,"journal":{"name":"Optical Interference Coatings Conference (OIC) 2019","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-06-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Laser Induced Thermal Stress in Optical Thin Films\",\"authors\":\"A. Firth, U. Srinivasan\",\"doi\":\"10.1364/OIC.2019.THB.8\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Thermal stress of optical thin film materials SiO2, HfO2, Al2O3, TiO2, and MgF2 exposed to laser pulse is simulated using 2D finite element method. Thermal stress is compressive and MgF2 film has the least value.\",\"PeriodicalId\":119323,\"journal\":{\"name\":\"Optical Interference Coatings Conference (OIC) 2019\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-06-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical Interference Coatings Conference (OIC) 2019\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/OIC.2019.THB.8\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Interference Coatings Conference (OIC) 2019","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/OIC.2019.THB.8","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Laser Induced Thermal Stress in Optical Thin Films
Thermal stress of optical thin film materials SiO2, HfO2, Al2O3, TiO2, and MgF2 exposed to laser pulse is simulated using 2D finite element method. Thermal stress is compressive and MgF2 film has the least value.
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